Search for: All records

Machine learning (ML)-based techniques for electronic design automation (EDA) have boosted the performance of modern integrated circuits (ICs). Such achievement makes ML model to be of importance for the EDA industry. In addition, ML models for EDA are widely considered having high development cost because of the time-consuming and complicated training data generation process. Thus, confidentiality protection for EDA models is a critical issue. However, an adversary could apply model extraction attacks to steal the model in the sense of achieving the comparable performance to the victim's model. As model extraction attacks have posed great threats to other application domains, e.g., computer vision and natural language process, in this paper, we study model extraction attacks for EDA models under two real-world scenarios. It is the first work that (1) introduces model extraction attacks on EDA models and (2) proposes two attack methods against the unlimited and limited query budget scenarios. Our results show that our approach can achieve competitive performance with the well-trained victim model without any performance degradation. Based on the results, we demonstrate that model extraction attacks truly threaten the EDA model privacy and hope to raise concerns about ML security issues in EDA. 

Analog integrated circuit (IC) placement is a heavily manual and time-consuming task that has a significant impact on chip quality. Several recent studies apply machine learning (ML) techniques to directly predict the impact of placement on circuit performance or even guide the placement process. However, the significant diversity in analog design topologies can lead to different impacts on performance metrics (e.g., common-mode rejection ratio (CMRR) or offset voltage). Thus, it is unlikely that the same ML model structure will achieve the best performance for all designs and metrics. In addition, customizing ML models for different designs require more tremendous engineering efforts and longer development cycles. In this work, we leverage Neural Architecture Search (NAS) to automatically develop customized neural architectures for different analog circuit designs and metrics. Our proposed NAS methodology supports an unconstrained DAG-based search space containing a wide range of ML operations and topological connections. Our search strategy can efficiently explore this flexible search space and provide every design with the best-customized model to boost the model performance. We make unprejudiced comparisons with the claimed performance of the previous representative work on exactly the same dataset. After fully automated development within only 0.5 days, generated models give 3.61% superior accuracy than the prior art. 

Deep learning has been widely applied in various VLSI design automation tasks, from layout quality estimation to design optimization. Though deep learning has shown state-of-the-art performance in several applications, recent studies reveal that deep neural networks exhibit intrinsic vulnerability to adversarial perturbations, which pose risks in the ML-aided VLSI design flow. One of the most effective strategies to improve robustness is regularization approaches, which adjust the optimization objective to make the deep neural network generalize better. In this paper, we examine several adversarial defense methods to improve the robustness of ML-based lithography hotspot detectors. We present an innovative design rule checking (DRC)-guided curvature regularization (CURE) approach, which is customized to robustify ML-based lithography hotspot detectors against white-box attacks. Our approach allows for improvements in both the robustness and the accuracy of the model. Experiments show that the model optimized by DRC-guided CURE achieves the highest robustness and accuracy compared with those trained using the baseline defense methods. Compared with the vanilla model, DRC-guided CURE decreases the average attack success rate by 53.9% and increases the average ROC-AUC by 12.1%. Compared with the best of the defense baselines, DRC-guided CURE reduces the average attack success rate by 18.6% and improves the average ROC-AUC by 4.3%. 

Accurate and efficient on-chip power modeling is crucial to runtime power, energy, and voltage management. Such power monitoring can be achieved by designing and integrating on-chip power meters (OPMs) into the target design. In this work, we propose a new method named DEEP to automatically develop extremely efficient OPM solutions for a given design. DEEP selects OPM inputs from all individual bits in RTL signals. Such bit-level selection provides an unprecedentedly large number of input candidates and supports lower hardware cost, compared with signal-level selection in prior works. In addition, DEEP proposes a powerful two-step OPM input selection method, and it supports reporting both total power and the power of major design components. Experiments on a commercial microprocessor demonstrate that DEEP’s OPM solution achieves correlation 𝑅 > 0.97 in per-cycle power prediction with an unprecedented low area overhead on hardware, i.e., < 0.1% of the microprocessor layout. This reduces the OPM hardware cost by 4 − 6× compared with the state-of-the-art solution. 

Applying machine learning (ML) in design flow is a popular trend in Electronic Design Automation (EDA) with various applications from design quality predictions to optimizations. Despite its promise, which has been demonstrated in both academic researches and industrial tools, its effectiveness largely hinges on the availability of a large amount of high-quality training data. In reality, EDA developers have very limited access to the latest design data, which is owned by design companies and mostly confidential. Although one can commission ML model training to a design company, the data of a single company might be still inadequate or biased, especially for small companies. Such data availability problem is becoming the limiting constraint on future growth of ML for chip design. In this work, we propose an Federated-Learning based approach for well-studied ML applications in EDA. Our approach allows an ML model to be collaboratively trained with data from multiple clients but without explicit access to the data for respecting their data privacy. To further strengthen the results, we co-design a customized ML model FLNet and its personalization under the decentralized training scenario. Experiments on a comprehensive dataset show that collaborative training improves accuracy by 11% compared with individual local models, and our customized model FLNet significantly outperforms the best of previous routability estimators in this collaborative training flow.